| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-204 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate |
1998-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acbd15c0b9a3492d540b61faab305477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea4ec8f32d2817d723763b2f8aae588
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b1c17bed52f57d72ac1791d573e48e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a006334c932ad925782f64ce8f7d84ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad6f9a249d3b61169db33258b14f57bf |
| publicationDate |
1999-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19816574-A1 |
| titleOfInvention |
Process for the production of resonant filters |
| abstract |
A method for producing resonant filters is proposed, comprising the following steps: DOLLAR A coating a substrate which is transparent for a desired wavelength range with a thin metal film; DOLLAR A application of a photoresist to the thin metal film; DOLLAR A holographic exposure of the photoresist with periodic structure elements and development of the photoresist; DOLLAR A etching away the exposed metal film according to the given pattern, the remaining photoresist acting as an etching mask, and DOLLAR A removing the remaining photoresist. |
| priorityDate |
1998-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |