http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19804971-B4

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filingDate 1998-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21e14939f03ad969532bc2207a53e21c
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publicationDate 2004-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19804971-B4
titleOfInvention Analysis method for water-soluble impurities in a clean room atmosphere in the production of semiconductor components and device for carrying out this method
abstract Analysis method for water-soluble impurities in a clean room for the production of semiconductor components with the following process steps: a) the temperature of the reference air is kept constant; b) condensation of the reference air to be analyzed and liquefaction of the water contained in the reference air; c) pressurizing the liquefied water drops and supplying the water drops to an analysis device; and d) Carrying out a qualitative and quantitative analysis using the analysis device.
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