http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19756518-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_05a31d15146049253ebe5354fed884ea |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 |
| filingDate | 1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d7c3042b01871e7c32e31e2ca87b148 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8cae0b46913ce8f1bf1874c94f6eabe |
| publicationDate | 1999-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-19756518-A1 |
| titleOfInvention | Manufacturing method for a phase shift photomask |
| abstract | A phase-shift photomask production process comprises (a) forming light screening structures (72) in a zone of a transparent substrate (71); (b) covering sections of the structures (72) and the substrate (71) with a first protective layer structure; (c) etching the substrate (71) to form a light-permeable section (5'), using the light screening structures (72) and the protective layer structure as mask; (d) forming a second protective layer on the transparent section (5'), the screening structures and the first protective layer structure; (e) exposing and then removing the first protective layer structure and exposing the screening structures (72) and the transparent substrate (71); (f) using the exposed screening structures (72) as seeds for growing an aluminium layer structure; (g) etching the exposed transparent substrate (71); (h) anisotropically etching the aluminium layer structure; and (i) re-etching the consequently exposed transparent substrate surface to form a phase-transfer section (73) and a phase-shift section. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10206188-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6569772-B2 |
| priorityDate | 1997-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.