http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19713148-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-495
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-30
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G31-00
filingDate 1997-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1998-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19713148-A1
titleOfInvention Process for the synthesis of aluminum vanadate and preparation of a gas sensitive layer
abstract Synthesis of aluminium vanadate (AlVO4) and production of a gas sensitive layer are carried out by dissolving a vanadium alkoxide in a benzene derivative, preferably toluene or benzene, adding an aluminium alkoxide at room temperature, refluxing for several hours and partially hydrolysing using a water:vanadium molar ratio of about 3:1 to form a sol or gel which is then calcined at 500-700 deg C to produce aluminium vanadate. Preferably, the vanadium alkoxide is vanadyl ethoxy ester (VO(CH2CH3)3) and the aluminium alkoxide is aluminium isopropylate (Al(OPr)3). Also claimed are: (i) the use of a sol or gel, produced as above, for production of a gas sensitive layer of aluminium vanadate by spin coating on a substrate and then calcining; and (ii) use of an aluminium vanadate powder, formed from a gel produced as above, for production of a gas sensitive layer of aluminium vanadate by screen printing on a substrate.
priorityDate 1997-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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