http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19708512-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 1997-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a090c859fa4d71a7256390a8da5d96d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7b44a91220b90e33e66783239fd7ec1
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publicationDate 1998-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19708512-A1
titleOfInvention Structure of a phase shift mask and method of manufacturing the same
abstract A novel phase shift mask has a transparent substrate (20) bearing one of the following layer sequences: (a) a phase shift layer (22), an adhesion promoting layer (23) and a light screening layer (24); (b) a substrate protection layer, a phase shift layer with two edge regions, two adhesion promoting layers, extending over respective edge regions of the phase shift layer, and two light screening layers; or (c) a light screening layer of predetermined width, an adhesion promoting layer and a phase shift layer covering the entire exposed surface of the light screening and adhesion promoting layers. Also claimed are processes for producing the above phase shift mask by sequential layer forming and patterning operations.
priorityDate 1996-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.