http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19707645-A1

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filingDate 1997-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a44df7e5f64e3cbf54e23073274a4ceb
publicationDate 1998-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19707645-A1
titleOfInvention Process for layer thickness analysis and material concentration determination of thin layers
abstract The method includes the step of determining a respective layer thickness of at least two differently thick layers which consist of the same material by using an atom absorption spectrum analysis method. The layers are excited by device of particles or electromagnetic radiation, preferably X-ray radiation, whereby the emission of a characteristic, layer-specific X-ray radiation is induced in the layers, whose intensity is measured by device of suitable energy- and/or wavelength-dispersive X-ray fluorescence radiation detectors through determination of corresponding X-ray count rates, from which layer material-specific constants are determined. The layer thickness of any layer treated in this way, is determined as a function of the corresponding constants determined for that specific material, and a corresponding X-ray count rate determined by a respective electromagnetic irradiation of the layer.
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