http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19524881-A1

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filingDate 1995-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f24ef9a89776eeb8d6775a9e479c7ab4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a736e6336b498423df24fe879ff2cc1
publicationDate 1996-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19524881-A1
titleOfInvention Method of manufacturing a piezoelectric resonance component
abstract The method enables mfr. of a piezoelectric resonance component. The component has a hollow cavity (12). This is formed around an oscillator electrode (3a,3b) of a piezoelectric resonance element (1). First, an organic silicon connection (10) is provided around the oscillator electrode (3a,3b) of the piezoelectric resonance element (1). A film (11) is then formed around the piezoelectric resonance element (1) and the organic silicon connection (10). The hollow chamber (12) is then formed by dispersing the organic silicon connection outwards through the film (11). An outer covering material (13) is then formed around the film (11). The application of the organic connection (10) pref. includes the step of applying at least a connection of silane, chlorosilane, etc.. The step of applying the film (11) pref. involves applying a UV radiation curable resin (13).
priorityDate 1994-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.