| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-30403 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-025 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate |
1995-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16ecc33086680f7effe40b059e8b3f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9351d325acce9e58f643e874f8e2002a |
| publicationDate |
1995-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19501387-A1 |
| titleOfInvention |
Method of forming a substantially uniform array of sharp tips |
| abstract |
The method involves masking a substrate, for defining a masked array, then plasma etching the substrate to form an array of pointed tips. The plasma etching of the substrate is continued after full undercut while the mask remains balanced on the pointed tips. Then it entails removing the mask when all of the tips have become sharp. The mask used in this method is a hard mask and it is patterned as an array of e.g. circles, which have a diameter in an approximate range of 1 micron. The etching continues on any of the tips that becomes sharp until a majority of the tips are sharp. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9873949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19534228-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102013211178-A1 |
| priorityDate |
1994-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |