patent/DE-112020006067-T5

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112020006067-T5

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCAdditional	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341
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classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-12
filingDate	2020-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ccc62bdb7659b13947af80a51fbaf08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_638eff465046849df93493e00bcd0c0f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c280b1770e12c01885b3b6bf1ecde91c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65d44d073fd68554e33e7243b991d1a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2c4201cfc2ef9aa52491f31b6cdc994 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1338b99d0d24998c754b68a537395a76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d6dc81bd45feb9366b9db4505b8686b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f11624fd0cc243ed9b353bd83206645f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef77dd8de16e4cd712fd6a822a4065a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d00365d26d0e02de0bbe9a11c4b2f27
publicationDate	2022-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	DE-112020006067-T5
titleOfInvention	ELECTROSTATIC CHUCK WITH REDUCED ELECTRICITY LEAKAGE FOR A HYBRID PROCESS FOR WAFER SEGMENTATION BY LASER SCRIPPING AND PLASMA ETCHING
abstract	Electrostatic chucks with reduced current leakage and methods for dicing semiconductor wafers are described. In one example, an etching apparatus includes a chamber and a plasma source within or coupled to the chamber. Inside the chamber is an electrostatic chuck. The electrostatic chuck has a conductive base with a plurality of notches on a peripheral edge thereof. In addition, the electrostatic chuck has a plurality of lift pins corresponding to the plurality of notches, respectively.
priorityDate	2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226

Total number of triples: 38.