| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fb0b77f42ce199bf06dc1fd0a7e29197 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e32c58ee92ed94bcba93539d6f0a6ed |
| publicationDate |
2021-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-112019003914-T5 |
| titleOfInvention |
POLISHING COMPOSITION |
| abstract |
A polishing composition is provided which is capable of quickly removing an oxide layer even with a lower concentration of abrasive. A polishing composition includes: silica having a silanol group density of 2.0 OH / nm 2 or higher; and an organic silicon compound terminally having an amino group, a methylamino group, a dimethylamino group or a quaternary ammonium group, the organic silicon compound having two or more alkoxyl groups or hydroxyl groups bonded to a Si atom thereof. However, the quaternary ammonium group of the organic silicon compound does not have an alkyl group having a carbon number of 2 or more. |
| priorityDate |
2018-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |