| abstract |
Problem: to provide a polishing composition with which a substrate on which a layer of silica or the like is formed can be polished at high speed using abrasive grains which do not cause defects and increase the mechanical friction effect and at the same time a high surface precision with a few scratches of the like can be achieved. Solution: a polishing composition with: abrasive grains; modified microfibrillated cellulose in which at the C6 site in the cellulose units at least a portion of the hydroxyl groups is oxidized to carboxyl groups; and a dispersing agent, wherein the content of Na and K is 100 ppm or less per solid content. |