http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112015006364-T5

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filingDate 2015-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_279671f9d677828ef52bae79fcea0bb4
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publicationDate 2017-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-112015006364-T5
titleOfInvention A method of producing a copper thin film by using a single crystal copper target
abstract Disclosed is a method for producing a copper thin film using a single crystal copper target, and more particularly, a method for producing a copper thin film using a single crystal copper target in which a copper thin film is deposited on a sapphire sheet substrate by high frequency sputtering using a Czochralski grown single crystal copper target therefore show a high quality in terms of crystallinity. The method comprises depositing a copper thin film on a sapphire wafer substrate by a high frequency sputtering process using a disc-shaped single crystal copper target obtained by cutting Czochralski grown cylindrical single crystal copper.
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Total number of triples: 26.