| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22691f78e0679dc391e7172ba32d0b66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40dcf6ff094e42baf16e0eec03443e75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_067d64e1f45388810c68a0e6f576fe48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58c55c8a433fde54e93d7037d48817a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc396555fddda634d3b611c26022cda0 |
| publicationDate |
2014-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-112012004718-T5 |
| titleOfInvention |
Hybrid photoresist composition and patterning method using the same |
| abstract |
The present invention relates to a hybrid photoresist composition for improved resolution and to a patterning method using the photoresist composition. The photoresist composition includes a photosensitive acid generator, a crosslinking agent, and a polymer having a hydrophobic monomer unit and a hydrophilic monomer unit containing a hydroxyl group. At least some of the hydroxyl groups are protected with an acid labile functional group having a low activation energy. The photoresist is capable of producing a hybrid response to a single exposure. The patterning process uses the hybrid reaction to form a patterned pattern in the photoresist layer. The photoresist composition and patterning method of the present invention are useful for printing small elements with precise image control, in particular, small size spaces. |
| priorityDate |
2011-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |