http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112012001891-T5

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filingDate 2012-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a52c78287772e6465bdc60e7a992b33
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publicationDate 2014-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-112012001891-T5
titleOfInvention A method of polishing a non-oxide single crystal substrate
abstract It is a polishing method for polishing a non-oxide single crystal substrate, such as. A silicon carbide single crystal substrate, provided at a high polishing speed, thereby obtaining a high quality surface which is smooth and has excellent surface properties. This polishing method is a method of supplying a polishing liquid to a polishing pad containing no abrasive grains so that a surface of the non-oxide single crystal substrate to be polished and the polishing pad are brought into contact with each other and polishing the surface to be polished by a relative movement between them, the method being characterized in that the polishing liquid comprises an oxidizing agent whose redox potential is 0.5 V or more and which contains a transition metal, and water and contains no abrasive grains.
priorityDate 2011-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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