| abstract |
This invention relates to an apparatus comprising: a plurality of plates in a stack defining at least one process layer and at least one heat exchange layer, each plate having a peripheral edge, wherein the peripheral edge of each plate adjoins the peripheral edge of the next adjacent one Plate is welded, so as to obtain a circumferential seal of the stack, wherein the ratio of the average area of each of the adjacent plates to the average penetration depth of the welding material between the adjacent plates is at least about 100 cm 2 / mm. The stack can be used as a core assembly for a microchannel apparatus. The microchannel apparatus can be used to perform one or more operations including chemical reactions, such as SMR reactions. |