http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112010005555-T5

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c186e9ae8cafab5df5c8d80cfa7b0fa1
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
filingDate 2010-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8547b5de250b0505a4158fc1b9523776
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d2a65f1516660bb894eb81a667aa0fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4e0623a11f80c164bb8f879d0840692
publicationDate 2013-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-112010005555-T5
titleOfInvention Polishing agent, compound semiconductor manufacturing method and semiconductor device manufacturing method
abstract There is provided a polishing agent, a compound semiconductor manufacturing method and a semiconductor device manufacturing method using the agent, whereby the surface quality of compound semiconductor substrates can be favorably maintained and, moreover, high polishing rates can be maintained. The polishing agent is a polish for Ga α In (1-α) As β P (1-β) composite semiconductors (wherein 0 ≤ α ≤ 1; 0 ≤ β ≤ 1) and contains an alkali metal carbonate, an organic alkali metal salt, a chlorine-based oxidizer and an alkali metal phosphate, wherein the sum of the concentrations of the alkali metal carbonate and the organic alkali metal salt is between 0.01 mol / liter and 0.02 mol / liter inclusive. The compound semiconductor manufacturing method comprises a step of preparing a Ga α In (1-α) As β P (1-β) compound semiconductor (where 0 ≤ α ≤ 1; 0 ≤ β ≤ 1) and a step of polishing the surface of Compound semiconductor using the above-described polishing agent.
priorityDate 2010-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004327614-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0767666-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411550719
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID402
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526493
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409253920
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449316130
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419545395
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19660
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6909
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13355
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5182128
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9020
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6328145
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577416
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577479
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31170
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8736
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577480
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559170
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453719446
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1061
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10340
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID517106
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448098817
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449626508
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID104770
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559526
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451829787
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID517121
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559553
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5357696
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559376
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557764
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23696331
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61739
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454479250
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24455
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23419966
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411211448
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426256167
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5360545

Total number of triples: 60.