http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112008003598-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14056f7dc72b8295c19863efc4d65bff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5dbf8064c65606e8e9b15990add73fa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd11e67cb57e3e009660490292f3b788 |
| publicationDate | 2016-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-112008003598-B4 |
| titleOfInvention | A method of etching a high aspect ratio aperture |
| abstract | A method of etching an opening in a dielectric layer comprising: Introducing gases into a chamber, said gases comprising an oxygen source gas, an inert gas, C 2 F 4 , and C 4 F 6 , C 4 F 8 or a mixture of C 4 F 6 and C 4 F 8 , wherein C 4 F 6 : C 2 F 4 , C 4 F 8 : C 2 F 4 , or C 4 F 8 and C 4 F 6 : C 2 F 4 are present in a ratio of about 0.25: 1 to 1.5: 1, forming a plasma from the gases in the chamber; and etching the aperture through the dielectric layer to an underlying substrate, wherein during the etching, a uniform polymer layer is formed and maintained along the sidewalls of the aperture, and wherein the oxygen source gas reacts with carbon and fluorine-containing ions in the plasma to effect the deposition of polymer at the bottom of the opening during etching. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9514959-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10381240-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11152223-B2 |
| priorityDate | 2008-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.