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publicationDate 2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-112008002551-T5
titleOfInvention Process for depositing ternary oxide gate dielectrics and structures formed thereby
abstract Method, comprising: Introducing a first metal source, a second metal source and an oxygen source into a chamber; and Forming a ternary oxide film comprising a first percentage of the first metal, a second percentage of the second metal, and a third percentage of oxygen.
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