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publicationDate 2016-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10356178-B4
titleOfInvention Cleaning solution for photoresist and its use
abstract A cleaning solution for photoresist patterns, comprising: H 2 O as a solvent; a compound represented by the following formula 1 as a surface-active agent; and an alcohol in which R is C 2 -C 20 alkyl or C 6 -C 25 alkylaryl; each of x, y and z is an integer ranging from 0 to 10; a is 2 or 3; and b is an integer ranging from 2 to 50. formula 1
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