| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate |
2003-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_069f66864ece0cff4f5d2a7ae10dc289
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_938eb11bcb27798296a411b0496f1cba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2b8b1060a21dcb4aa9ee3f4d24d7c14 |
| publicationDate |
2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-10304631-B4 |
| titleOfInvention |
Photosensitive resin composition of negative type |
| abstract |
A negative-type photosensitive resin composition comprising: Component (A), which is a product of the Michael addition reaction between an amino group-containing compound (a-1) of the general formula (I): wherein n is an integer from 1 to 4, and a polyethylene glycol di (meth) acrylate (a-2) of the general formula (II): wherein R 1 is hydrogen or a methyl radical and m is an integer from 4 to 14. |
| priorityDate |
2002-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |