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filingDate 2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b099804d53b7794765fa594326948b4d
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publicationDate 2004-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10256257-A1
titleOfInvention Device and method for coating a substrate and coating on a substrate
abstract A device (5) for coating a substrate (10) with means for generating a gas flow and a plasma jet source (20) is proposed, with which a plasma jet (40) acting on the substrate (10) can be generated, whereby in addition to the plasma jet source ( 20) a hollow cathode (23) which causes material to enter the substrate (10) during operation is provided. Furthermore, a method for coating a substrate (10) is proposed, a first functional layer (13) with or from a layer having a matrix with nanoscale particles embedded therein being deposited on the substrate (10) with the aid of a plasma beam source (20), and wherein a second functional layer (11) is deposited on the substrate (10) using a hollow cathode (23) via gas flow sputtering. Finally, a coating (5) on a substrate (10) is proposed, a second functional layer (11) on the substrate (10), an intermediate layer (12) on the second functional layer (11) and a first on the intermediate layer (12) Functional layer (13) is provided. The intermediate layer (12) is designed as a gradient layer that provides a gradual compositional transition between the second functional layer (11) and the first functional layer (13), while at least one of the functional layers (11, 13) has a matrix layer with nanoscale particles embedded therein ,
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priorityDate 2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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