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filingDate 2002-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2d90d08126e2a13a2c4edbc0f49aeec
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publicationDate 2004-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10253855-A1
titleOfInvention Insulation layer material for integrated circuits in Damascene architecture
abstract The invention relates to the field of electronics / microelectronics and relates to an insulation layer material such as can be used, for example, as a dielectric between copper conductor tracks. The object of the invention is to provide an insulating layer material for integrated circuits in Damascene architecture, which has k values of <4.0 with an adjustable pore size of <2.0 nm. The object is achieved by an insulation layer material for integrated circuits in Damascene architecture, containing or consisting of molecules which are only occupied by atoms on the surface and which are separated from one another by further molecules or groups of molecules, the further molecules or groups of molecules being at least two Have sites that are connected to the molecules that are only occupied by atoms on the surface via chemical and / or physical interactions.
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Total number of triples: 42.