http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10249350-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd446fb0d73aa96d044fea2eaa3c8ebc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate | 2002-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8df6caf3043d2c1e4d8720b0f332744c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d51678c066850707b4ad3837ceb25f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94fb0e5a5e3094e4d778b48ea8c0fea1 |
| publicationDate | 2004-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10249350-A1 |
| titleOfInvention | Device and method for anisotropic plasma etching of a substrate, in particular a silicon body |
| abstract | The invention relates to a method and a device suitable for carrying it out, for anisotropic plasma etching of a substrate (59), in particular a silicon body. The device has a chamber (53) and a plasma source for generating a high-frequency electromagnetic alternating field and a reaction area (20) for generating a plasma with reactive species within the chamber (53), the reactive species being affected by an etching gas and the alternating field a passivating gas that is introduced at the same time, but spatially separated from it. A means (5, 62, 63) is also provided, with which in the reaction area (20) at least one first zone (23, 33, 43) charged with the etching gas and at least one second zone (22, loaded with the passivating gas) 32, 42) can be defined. In addition, the device has a mixing area (21) arranged downstream of the reaction area (20), with which reactive species generated from the etching gas in the first zone (23, 33, 43) and from the in the second zone (22, 32, 42) Passivating gas generated reactive species are mixed together before acting on the substrate (59). |
| priorityDate | 2002-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.