http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10239768-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 |
| filingDate | 2002-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa777e1a25f93c8f18382bb87c9a15d |
| publicationDate | 2013-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10239768-B4 |
| titleOfInvention | Photoresist strip solution and method of stripping photoresists using same |
| abstract | Disclosed is a photoresist strip solution comprising (a) a specified quaternary ammonium hydroxide, e.g. (B) a water-soluble amine, (c) water, (d) a corrosion inhibitor, and (e) a water-soluble organic solvent, wherein the compounding ratio of component (a) to component (b) is in the range from 1: 3 to 1:10 by mass, as well as a method of stripping photoresists using the solution. The strip solution of the invention ensures effective protection of Al, Cu and other wiring metal conductors from corrosion as well as efficient stripping of the photoresist film, ashing residues such as e.g. B. modified photoresist film and metal deposits. It also ensures efficient stripping of Si-based residues and effective protection of the substrate (especially the backside of a Si substrate) from corrosion. |
| priorityDate | 2001-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 222.