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filingDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10228528-B4
titleOfInvention Diffusion barrier film and its manufacturing method, semiconductor memory and its manufacturing method
abstract Diffusion barrier filmnmade of alumina, which is at least one kind of elements of the groupnContains II as an additive,nwherein carbon dioxide and / or carbon monoxide on the at least onenType of elements of group II, which at the grain boundaries withinna microcrystalline bodynof the aluminum oxide film are adsorbed.
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