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publicationDate 2003-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10203730-A1
titleOfInvention Process for the deposition of metal-free carbon layers
abstract A method for the deposition of metal-free amorphous hydrogen-containing carbon layers works with the sputtering of targets on substrates. DOLLAR A A pure carbon target, in particular a graphite target, is used and biased with a negative DC voltage. The substrate is also preferably supplied with direct current. It is preferred to work in the unbalanced magnetron mode. This enables the production of metal-free DLC layers with high wear and hardness values.
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