| abstract |
A dual gauge device (10, 20, 30) comprising a first substrate (110), a first gauge layer (120) and a second gauge layer (130, 130B) is provided. The first sensing element layer (120) is arranged on the first substrate (110) and has a plurality of first sensing elements (S1). The second measuring element layer (130, 130B) is arranged on the first measuring element layer (120) and has a plurality of second measuring elements (S2), a normal projection of the second measuring element (S2) on the first substrate (110) having a normal projection of the first measuring element ( S1) overlapped on the first substrate (110). |