http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102022101059-A1

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filingDate 2022-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2022-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102022101059-A1
titleOfInvention Extended shallow trench isolation for very low loss in lateral fin-type bipolar transistor devices
abstract A lateral bipolar transistor (BJT) device includes: an emitter region, a collector region, and a base region, the base region being disposed between and laterally separating the emitter region and the collector region, the base region comprising an intrinsic base region; and a recess formed in a semiconductor substrate and filled with an insulating material, the recess physically separating a bottom surface of the intrinsic base region from the semiconductor substrate.
priorityDate 2021-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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