http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102021206564-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8ace3886ad985680695e66f92b53552 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-86 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate | 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dbfa9a498c5155d2ae3cd262817d807 |
| publicationDate | 2022-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102021206564-A1 |
| titleOfInvention | ENDPOINT DETERMINATION BY INDUCED DESORPTION OF GASES AND RECOVERING ANALYSIS |
| abstract | The present invention comprises a method for use with a lithographic mask, comprising the steps of: (a.) directing a particle beam onto an element of the lithographic mask in an atmosphere of gaseous particles, (b.) inducing a desorption and/or adsorption process of at least some of the gas particles in a region of the element and (c.) detecting a signal from secondary particles and/or backscattered particles and/or another free jet signal generated by the particle beam during the desorption and/or adsorption process. The present invention further relates to a corresponding method for use with a lithographic mask. |
| priorityDate | 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 46.