| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_168e7d1c85d1f41726aaa99e1591c460 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10148 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B21-367
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B21-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-2513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-2433
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04N23-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04N23-676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04N23-959
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-521
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04N23-673
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-571 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-25 |
| filingDate |
2021-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3d7689c5f1f2f45ab457e7a6495c8c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1e097ea2bf363f63919b1a6c9a466b8 |
| publicationDate |
2022-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102021127795-A1 |
| titleOfInvention |
PROJECTED PATTERN METROLOGY SYSTEM FOR POINTS-FROM-FOCUS TYPE PROCESSES |
| abstract |
A metrology system is provided that includes a projected pattern for point-from-focus type processes. The metrology system includes an objective lens section, a light source, a pattern projection section, and a camera. Different lenses (e.g. objective lenses) with different magnifications and cut-off frequencies can be used in the system. The pattern projection section includes a pattern component having a pattern. At least a majority of the area of the pattern contains pattern sections that do not repeat at regular intervals across the pattern (e.g., corresponding to a diverse spectrum of spatial frequencies that give a relatively flat power spectrum over a desired range and where different lenses with different cutoff frequencies can be used). The pattern is projected onto a workpiece surface (e.g. for contrast generation) and an image stack is acquired from which focus curve data is determined which indicate three-dimensional positions of workpiece surface points. |
| priorityDate |
2020-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |