http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102021111916-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2208-0053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2208-00415 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B3-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-0285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-067 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0013 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J8-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D15-00 |
| filingDate | 2021-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38c5f8ecce0e793171f4cb0d61cc494c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc56cf588cce47fd5026b0dd6deab226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f13cdf417bb9e3b104367169015b692 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a67ff03b64bd84607a8b1c582ba35900 |
| publicationDate | 2022-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102021111916-A1 |
| titleOfInvention | METHOD OF DIRECT RESISTANCE HEATING OR ANALYSIS OF A FILL IN A PROCESS ENGINEERING APPARATUS |
| abstract | Described and illustrated is a method for direct resistance heating of a filling (2) in a process engineering apparatus (1) with a plurality of distributed over a first enveloping surface portion (7,8) of the apparatus (1) and arranged at least partially over the filling (2) Electrodes (9) in an electrically conductive connection, with at least a first pair of electrodes (9) or a first group of electrodes (14,22,25,26) in a first peripheral section (UA ) and at least one second pair of electrodes (9) or a second group of electrodes (15,23) is arranged in a second peripheral section (UA) comprising at most 45% of the cross-sectional circumference and the first peripheral section (UA) and the second Circumferential section (UA) at most partially overlap. So that the process engineering apparatus can be operated effectively and reliably without excessive effort, it is provided that in a first time interval the at least one first pair of electrodes (9) or the at least one first group of electrodes (14, 22, 25, 26) an electrical voltage that is at least 20% greater than that applied to other electrodes (9) or another group of electrodes (9) is applied in a second time interval to at least the at least one second pair of electrodes (9) or the at least one second group an electrical voltage that is at least 20% greater than that applied to other electrodes (9) or another group of electrodes (9) is applied to electrodes (15, 23) and that the first time interval and the second time interval are provided multiple times and alternately. |
| priorityDate | 2021-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.