| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07B2200-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2224 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2019-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57b6c320da24fcf643eb534d04530002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_196b0d610e83544385717e96fe4d152d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2d20c1f17fdafed06544e9833bddcab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12b1b03020be791b8fa2c5ff8e7abda2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18ccab5690c0de011786aab02ac5f735 |
| publicationDate |
2021-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102019126910-A1 |
| titleOfInvention |
ORGANOMETALLIC CLUSTER PHOTORESISTS FOR EUV LITHOGRAPHY |
| abstract |
The present disclosure relates to organotin cluster compounds of formula (I) and their use as photoresists in extreme ultraviolet lithography processes. |
| priorityDate |
2019-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |