| abstract |
A photoresist composition contains a conjugated photoresist additive, a photoactive compound and a polymer resin. The conjugated photoresist additive is one or more selected from the group consisting of a polyacetylene, a polythiophene, a polyphenylene vinylene, a polyfluorene, a polypryrrole, a polyphenylene and a polyaniline. The polyacetylene, polythiophene, polyphenylene vinylene, polyfluorene, polypryrrole, the polyphenylene and polyaniline contain a substituent selected from the group consisting of an alkyl group, an ether group, an ester group, an alkene group, an aromatic group, an anthracene group, an alcohol group, an amine group, one Carboxylic acid group and an amide group. Another photoresist composition contains a polymer resin with a conjugated residue and a photoactive compound. The conjugated residue is one or more selected from the group consisting of a polyacetylene, a polythiophene, a polyphenylene vinylene, a polyfluorene, a polypryrrole, a polyphenylene and a polyaniline. |