http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102018221760-A1

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filingDate 2018-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c46d54c8d294bcb35cced83637b590a
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publicationDate 2020-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102018221760-A1
titleOfInvention Method of analyzing a gas mixture and gas sensor
abstract The invention relates to a method for analyzing a gas mixture, in which a layer which is set up for the adsorption and / or absorption of constituents of the gas mixture is exposed to the gas mixture. It comprises cooling the layer from a first temperature (T 1 ) to a second temperature (T 2 ) and heating the layer from the second temperature (T 2 ) to a third temperature (T 3 ). While the layer has the first temperature (T 1 ), the second temperature (T 2 ) and the third temperature (T 3 ), at least one electrical resistance value (R) of the layer is measured in each case. The invention also relates to a method in which a first layer and a second layer are exposed to the gas mixture. The first layer is cooled from a first temperature (T 1 ) to a second temperature (T 2 ) and the second layer is cooled from a third temperature (T 3 ) to a fourth temperature (T 4 ). The first temperature (T 1 ) differs from the third temperature (T 3 ) and / or the second temperature (T 2 ) differs from the fourth temperature (T 4 ). While the first layer has the first temperature (T 1 ) and the second temperature (T 2 ) and the second layer has the third temperature (T 3 ) and the fourth temperature, at least one electrical resistance value (R) of the respective Layer measured. The components of the gas mixture are analyzed in both methods using the resistance values (R).
priorityDate 2018-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.