| abstract |
The present application relates to a device (100, 400) for in situ determination of a process resolution of a particle beam induced machining process (300, 390) of an element (110) for photolithography, the device (100, 400) comprising: (a) one Processing unit (140) which is designed to generate at least two reference structures (120, 130, 510-580, 1120) on the element (110) within a process environment (442, 448), which differ in at least one dimension; and (b) an analysis unit (180) which is designed to determine the dimensions of the at least two reference structures (120, 130, 510-580, 1120) in the process environment (442, 448) in order to determine the process resolution of the particle beam-induced Machining process (300, 390) to determine. |