| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0847
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7848
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02227 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
| filingDate |
2017-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fafef0d4e4b5e8134914d3aad4dba6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f29f27e99003eeae44782a2b894bec7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_482244aca5a86e4371c578705fecea37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1de17f6985e6fc1a1989ece0e4146bf1 |
| publicationDate |
2019-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102017126039-A1 |
| titleOfInvention |
INTEGRATED CIRCUIT DEVICE WITH SOURCE / DRAIN BARRIER |
| abstract |
Various examples of an integrated circuit device and a method of forming the device are disclosed herein. In one example, a method includes receiving a workpiece that includes a substrate and a device fin extending over the substrate. The component fin contains a channel region. A portion of the device fin next to the channel region is etched, and the etch creates a source / drain recess and forms a dielectric barrier within the source / drain recess. The workpiece is cleaned so that a lowermost portion of the dielectric barrier remains within a lowermost portion of the source / drain recess. A source / drain structure element is formed within the source / drain recess such that the lowermost portion of the dielectric barrier is disposed between the source / drain structure element and a remainder of the device fin. |
| priorityDate |
2017-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |