http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014222028-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6af9a57049d2d91c036d4f5ab49154cb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 |
| filingDate | 2014-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c07d9ef0e0f2fbdc3b9419212744dc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c42e845cdc93784f4eb37e2af0de9aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_caaa27820e39cc6687e399470f7a353a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f076a15c75091fd7aecd031749febf31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_875fbf9911a7018855404f1d2dddb42b |
| publicationDate | 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102014222028-B4 |
| titleOfInvention | Mask structures and manufacturing processes |
| abstract | Structure with a lithography mask (200), the lithography mask (200) comprising: a substrate (205); at least one reflective layer (210) over the substrate (205); and an absorbent film stack (220) over the at least one reflective layer (210), the absorbent film stack (220) comprising a plurality of first film layers (230) and at least one second film layer (240) with the at least one second film layer (240) between first Film layers of the plurality of first film layers (230) are sandwiched therebetween, wherein the first film layers (230) comprise a first material and the at least one second film layer (240) comprises a second material different from the first material, and wherein the first material comprises nickel and / or cobalt and / or platinum and / or palladium and the second material comprises a metal nitride, metal oxide or a combination thereof. |
| priorityDate | 2014-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.