| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-6489
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H02S50-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 |
| filingDate |
2014-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e1e317cf53c72b03b18333845c4d008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_044e32e91cdb64fdcf57697a028ab016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8a75db513d4204201d97c6f2a29ce9f |
| publicationDate |
2015-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102014205323-A1 |
| titleOfInvention |
Method for characterizing a semiconductor wafer |
| abstract |
The invention relates to a method for characterizing a semiconductor wafer, comprising the following method steps: A providing the semiconductor wafer; B determining the doping concentration and / or the sheet resistance of the semiconductor wafer; The invention is characterized in that, in method step B, the determination takes place at one or more measuring points located in a measuring range, wherein the measuring range lies within an edge region of the semiconductor wafer. |
| priorityDate |
2014-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |