http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014114947-A1

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6635a0116bafd2c08a0c99b78e132e99
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4583
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2014-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_844f2db6f6270135c25726b99392b191
publicationDate 2015-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102014114947-A1
titleOfInvention Device for depositing semiconductor layers and a susceptor for use in such a device
abstract The invention relates to a device for depositing semiconductor layers with a gas inlet element for introducing process gases into a process chamber and having a susceptor (3) with area sections bounded by receiving structures on a broad side of the susceptor (3) for positionally fixed recording of substrates to be coated with the semiconductor layers or dummy substrates. According to the invention, it is proposed that the receiving structures limit surface sections of different sizes and / or different circumferential contours.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D806046-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D852762-S
priorityDate 2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.