http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014114947-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6635a0116bafd2c08a0c99b78e132e99 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4583 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
filingDate | 2014-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_844f2db6f6270135c25726b99392b191 |
publicationDate | 2015-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DE-102014114947-A1 |
titleOfInvention | Device for depositing semiconductor layers and a susceptor for use in such a device |
abstract | The invention relates to a device for depositing semiconductor layers with a gas inlet element for introducing process gases into a process chamber and having a susceptor (3) with area sections bounded by receiving structures on a broad side of the susceptor (3) for positionally fixed recording of substrates to be coated with the semiconductor layers or dummy substrates. According to the invention, it is proposed that the receiving structures limit surface sections of different sizes and / or different circumferential contours. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019238930-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D806046-S http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D852762-S |
priorityDate | 2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.