http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014100005-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5946867900a2c8ba594556a5e8f02514
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2014-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0f0b133acef45311e54e1d8c83b4b26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f9a77876745d5564a149f8151480ddf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed8b33f2ff9ab9115839aab5e0c307d3
publicationDate 2014-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102014100005-A1
titleOfInvention Coating of resist on a substrate for ultra-high resolution lithography
abstract In the method for applying a very thin coating of resist (24) to a substrate (20) is a) on the surface of the substrate (20) an initial layer (22) of resist (24) by spin-coating applied, the initial layer (22) has an initial layer thickness, b) a flexible contact material (26) is provided which is brought into full contact with the layer of resist (24) and adheres to it, and c) the contact material (26) is peeled off and In this case, it takes part of the initial layer (22) which adheres to it, on the substrate (20) remains a wear layer (28), which has a reduced thickness relative to the initial layer (22). The coated substrate (20) is then further processed in an ultra-high resolution lithography process, in particular electron beam lithography.
priorityDate 2013-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0134269-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010023227-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6928746-B2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419513958
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3776

Total number of triples: 22.