| abstract |
The invention relates to a process for the production of polycrystalline silicon, comprising a deposition of polycrystalline silicon on a support body to obtain a polycrystalline silicon rod, or a deposition of polycrystalline silicon on silicon particles to obtain polycrystalline silicon granules, wherein the deposition in each case in a Reactor takes place, which is located in a clean room of class 1 to 100000, with filtered air is passed into the clean room, for filtering the air first at least one filter that separates particles greater than or equal to 1 micron and then a particulate matter filter, the particles smaller than 1 micron, happens. |