| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad487976a0c15e931c825084e6d6bd91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_483281d95c4dfe3aa669f633733cd201 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E50-30 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M23-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M25-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M29-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M29-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M41-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M41-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M21-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12P5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M1-107 |
| filingDate |
2013-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2116178bed37cdea11c3a47c341a183f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fee8a3c5c591da8c1273248001e6cecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c38939c57e27a2e05b743c091b3519f4 |
| publicationDate |
2017-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102013209734-B4 |
| titleOfInvention |
Process and apparatus for the methanation of gases by means of trickle bed reactors |
| abstract |
Process for the methanation of gaseous substrates, wherein the following steps are carried out: a) providing a reactor filled with growth bodies with methane-forming microorganisms immobilized on the surface of the growth bodies; b) sprinkling the growth bodies with the methane-forming microorganisms immobilized thereon with a process fluid, c) subjecting the reactor to a mixture of gaseous substrates, wherein the mixing ratio of the substrates in the gas phase is selected such that the dissolution of the gaseous substrates in the process fluid leads to a stoichiometric ratio of the gaseous substrates dissolved in the process fluid, d) discharging the generated gas mixture from the reactor. |
| priorityDate |
2013-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |