http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102012200994-A1

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filingDate 2012-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eefc74e92c4445f88671be742286b776
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7739b51872c39f2f93d9d6ea03f46bc
publicationDate 2013-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102012200994-A1
titleOfInvention Method for determining surface contamination of polycrystalline silicon
abstract The invention relates to a method for determining a surface contamination of polycrystalline silicon, comprising the steps a) providing two polycrystalline silicon rods by deposition in a Siemens reactor; b) impurities in the first of the two bars are determined immediately after deposition; c) The second rod is passed through one or more equipment in which polycrystalline silicon rods are further processed into rod pieces or polysilicon fragments, optionally cleaned, stored or packaged; d) Then impurities in the second bar are determined; wherein the difference of the particular impurities in the first and second bars results in surface contamination of polycrystalline silicon due to equipment and plant environment.
priorityDate 2012-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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