| abstract |
The invention relates to a method for depositing a LiPON layer on a substrate (1), wherein the evaporating material (3), which comprises at least the chemical elements lithium, phosphorus and oxygen in a vessel (2), is evaporated within a vacuum chamber , In this case, the evaporation material (3) by means of at least one thermal evaporation device (4a, 4b) is heated and admitted either a nitrogen-containing component in the vacuum chamber or a nitrogen-containing material co-evaporated and wherein the vessel (2) rising steam particle cloud before depositing on the Substrate is penetrated by a plasma (7). |