http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102011120210-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a03f9e4c20b48d001949be5fcb96ab5 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-035 |
| filingDate | 2011-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c737b2ccad0d6ceeb84c968a80f918b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a51b2cf0a600c37e6fac4cf4e02295db |
| publicationDate | 2013-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102011120210-A1 |
| titleOfInvention | Method and apparatus for cleaning silicon |
| abstract | In order to produce pure silicon as effectively as possible and to minimize both the energy consumption and the amount of exhaust gas and save operating costs, a method is provided, in which a silicon-containing gas or gas mixture is introduced as the input gas in a reactor with heated Abscheidekörpern provided therein, on the surfaces Silicon deposits, wherein the reactor forms a source gas having a portion of the input gas as the first output gas component and at least a second additional output gas component, and the output gas is provided to a downstream, further reactor, wherein at least a portion of the second output gas component is removed from the starting gas before it is introduced into the downstream reactor. Furthermore, an apparatus for carrying out the method is described. |
| priorityDate | 2011-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.