http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102011106864-B4

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G31-00
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G31-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G31-00
filingDate 2011-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24284a2f2c58105b70353d686aa3193d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0bdbf9259ec77f8364d6c6b6a81a395
publicationDate 2013-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102011106864-B4
titleOfInvention Process for the selective separation of vanadium from residues of titanium dioxide production (chloride process)
abstract The invention relates to a process for the selective separation of vanadium from solid aluminum-containing residues of titanium dioxide production by the chloride process, in particular from neutralized filter cake. The residues are first digested at up to 150 ° C at a pH of at least 11.5 and then precipitated at a pH of 8 to 10 aluminum hydroxide. The filtrate produced contains the vanadium in dissolved form. The vanadium can be subsequently precipitated with the aid of an ammonium salt.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3156370-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017063742-A1
priorityDate 2011-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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