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filingDate 2011-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102011090164-A1
titleOfInvention Repair of damaged surface areas of sensitive small ε dielectrics of microstructure devices after a plasma treatment by in-situ treatment
abstract Damaged surface areas of low-k dielectric materials can be more efficiently repaired by avoiding saturation of unsaturated silicon bonds after reactive plasma treatment based on OH groups typically used in conventional process strategies. Saturation of the unsaturated bonds can be accomplished by directly initiating a chemical reaction with a suitable organic species, thereby providing better reaction conditions, which in turn results in more efficient restoration of the dielectric properties.
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