http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102010004181-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f03ebf69512cbb11dd04d47ad2197511 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate | 2010-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_434146849ab424da323d093ea4d45ff3 |
| publicationDate | 2011-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102010004181-A1 |
| titleOfInvention | Metallcarboxylatkomplexe with Alkinligand as vaporizable precursor for metal or metal oxide deposition |
| abstract | 1. Metallcarboxylatkomplexe with Alkinligand as vaporizable precursor for metal or metal oxide deposition 2.1 Known metal (I) carboxylate complexes with alkyne ligand have too low a vapor pressure or a too low thermal resistance. The object of the invention are, in particular, new copper (I), silver (I) and gold (I) carboxylate complexes with alkyne ligand, which have markedly improved vapor pressure and complex resistance properties and good solubility in organic solvents. They should be directly evaporable as Metallprecursor, or allow the production of very concentrated Metallprecursorlösungen. 2.2 This object is achieved by a new metal carboxylate complex with a one-sidedly substituted, CH-acidic alkyne, wherein the metal carboxylate preferably has 6 carbon atoms, which are arranged as a branched alkyl group. 2.3 The invention relates to metal carboxylate complexes with alkyne ligand for use as a vaporizable metal precursor for ALD and CVD coating processes. Such coating methods are used for the production of semiconductors, solar cells and optical components. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018210597-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11643561-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019020682-A1 |
| priorityDate | 2009-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.