http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102009059016-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49c7c7d947f4481d87620430416a22b3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0077 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2208-00212 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-087 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J8-12 |
| filingDate | 2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8703f249db23d80b80856ca8ac0e4fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01586f56c473146619cb4ed7ff14adc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c0ad3695e7e7bb28c8d87cb0610e784 |
| publicationDate | 2019-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102009059016-B4 |
| titleOfInvention | Process for the treatment of a quartz sand or quartz glass grain |
| abstract | Method for treating a quartz sand or quartz glass grain (11) with a specific angle of repose (β) in the range of 25 to 36 degrees, in which the grain (11) is fed continuously via a grain inlet (7) to a heated treatment space (2), heated and gravity transported to a Körnungsauslass (8) and continuously discharged from the treatment chamber (2), wherein the grain (11) over at least a portion between Grannungseinlass (7) and Körnungsauslass (8) as a grain layer (18; 45) on a within the treatment chamber (2) arranged first chute (3; 43) which ends at a transfer opening (6) above the Körnungsauslasses (8), wherein the grain (11) one between a gas inlet (9) and a gas outlet (10) is subjected to flowing treatment gas, wherein the granulation layer (18; 45) has a minimum thickness of less than 5 cm and the first chute (3; Sliding surface which includes a cascade angle (α) with the horizontal, which is greater than 5 degrees greater than the specific angle of repose (β) of the grain (11). |
| priorityDate | 2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.