http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102009037154-B3

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filingDate 2009-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96533412c1205130d11cb616356d1a93
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publicationDate 2010-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102009037154-B3
titleOfInvention Process for the preparation of monosilane
abstract A process and the use of a plant for the production of monosilane (SiH 4 ) by catalytic disproportionation of trichlorosilane (SiHCl 3 ) are described. The trichlorosilane is reacted in a reaction column (100) on a catalyst and then purified in a rectification column (109). Between a reactive / distillative reaction zone (104, 105) in the reaction column (100) and the rectification column (109) are arranged one or more condensers (103) in which monosilane-containing reaction product from the reaction column (100) is partially condensed. However, these are exclusively capacitors that are operated at a temperature above -40 ° C.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016135159-A1
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Total number of triples: 32.